Semiconductor apparatus

ABSTRACT

A semiconductor apparatus has a configuration in which multiple copper wiring layers and multiple insulating layers are alternately layered. A low-impedance wiring is formed occupying a predetermined region. A first wiring pattern includes multiple copper wiring members arranged in parallel with predetermined intervals in a first copper wiring layer, each of which has a rectangular shape extending in a first direction. A second wiring pattern includes multiple copper wiring members arranged in parallel with predetermined intervals in a second copper wiring layer adjacent to the first copper wiring layer, each of which has a rectangular shape extending in a second direction orthogonal to the first direction. The region occupied by the first wiring pattern and that occupied by the second wiring pattern are arranged such that they at least overlap. The first wiring pattern and the second wiring pattern are electrically connected so as to have the same electric potential.

CROSS REFERENCE TO RELATED APPLICATIONS

The present application is a continuation of U.S. patent applicationSer. No. 13/214,737, filed Aug. 22, 2011, which is a continuation ofU.S. patent application Ser. No. 12/330,085 filed Dec. 8, 2008, theentire contents of which are incorporated herein by reference andpriority to which is hereby claimed. application Ser. No. 12/330,085claimed the benefit of the date of the earlier filed Japanese PatentApplication No. JP2007-316342, filed Dec. 6, 2007, priority to which isalso claimed herein, and the contents of which are also incorporated byreference.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates to a semiconductor apparatus, andparticularly to a semiconductor apparatus employing copper as a wiringmaterial.

2. Description of the Related Art

In recent years, improved fine semiconductor processes employ copperwiring. Copper wiring has a problem in that it is difficult to directlyetch the copper using a mask formed of resist. Accordingly, the copperwiring is formed as follows. That is to say, grooves (openings) areformed in an insulating layer, and a copper wiring film is formed on theentire area of a substrate using a sputtering method or a CVD method.Subsequently, the surface of the wiring film is ground down to the upperface of the wiring film.

Such a copper wiring process has a problem of so-called “dishing”, whichis a phenomenon in which the copper wiring has irregularities inthickness due to position irregularities in grinding rate in thegrinding process in which the wiring layer is ground over a wide area.In order to prevent dishing from occurring, the upper limit of thewiring width is defined by a process rule.

Patent Document [1]

Japanese Patent Application Laid Open No. H11-150114

In semiconductor circuits, in order to distribute a power supply line ora ground line to multiple portions, wiring having a certain level ofwidth (which will be referred to as “distribution wiring” in thisspecification) is formed in vicinity of pads for wire bonding (bondingpads). Also, a line through which an analog or digital signal having alarge amplitude is transmitted (which will be referred to as “powerline” in this specification) needs to be formed with a certain level ofline width. There is a need to form such a distribution wiring and apower line with low impedance. However, the dishing restricts the formof the wiring, leading to a problem in that it is difficult to reducethe impedance of such wiring.

SUMMARY OF THE INVENTION

The present invention has been made in order to solve such a problem.Accordingly, it is a general purpose of the present invention to providelow-impedance wiring in a semiconductor apparatus employing a copperwiring process.

An embodiment of the present invention relates to a semiconductorapparatus having a configuration in which multiple copper wiring layersand multiple insulating layers are alternately layered. Thesemiconductor apparatus includes wiring formed occupying a predeterminedregion. The wiring includes: a first wiring pattern formed in a firstcopper wiring layer, including multiple copper wiring members which areformed in parallel with predetermined intervals, and each of which has arectangular shape extending in a first direction; and a second wiringpattern formed in a second copper wiring layer adjacent to the firstcopper wiring layer, including multiple copper wiring members which areformed in parallel with predetermined intervals, and each of which has arectangular shape extending in a second direction orthogonal to thefirst direction. The region occupied by the first copper wiring pattern,the region occupied by the second copper wiring pattern, and theaforementioned predetermined region at least overlap. The first wiringpattern and the second wiring pattern are electrically connected to eachother so as to have the same electric potential.

With such an embodiment, wiring patterns are provided to adjacent wiringlayers such that they are arranged in the form of a mesh (waffle), andthe adjacent wiring layers are electrically connected to each other.Thus, such an embodiment provides a single wiring pattern having anoverall wide area and low impedance while maintaining a small wiringwidth of each wiring member so as to prevent dishing from occurring.

The semiconductor apparatus according to such an embodiment may furtherinclude a first via hole pattern which is arranged at positions at whichthe copper wiring members included in the first wiring pattern and thecopper wiring members included in the second wiring pattern overlap, andwhich electrically connects the first wiring pattern and the secondwiring pattern.

The semiconductor apparatus according to such an embodiment may furtherinclude: a third wiring pattern formed in a third copper wiring layeradjacent to the second copper wiring layer, including multiple copperwiring members arranged in parallel with predetermined intervals, andeach of which has a rectangular shape extending in the first direction;and a second via hole pattern which is arranged at positions at whichthe second wiring pattern and the third wiring pattern overlap, andwhich electrically connects the second wiring pattern and the thirdwiring pattern.

Each of the multiple copper wiring members included in the first wiringpattern may overlap or may be overlaid with the corresponding one of themultiple copper wiring members included in the third wiring pattern.

The via holes included in the second via hole pattern may be arranged soas to overlap or be overlaid with the respective via holes included inthe first via hole pattern, with the centers thereof matching oneanother.

The semiconductor apparatus according to such an embodiment may furtherinclude: a fourth wiring pattern formed in a fourth copper wiring layeradjacent to the third copper wiring layer, including multiple copperwiring members arranged in parallel with predetermined intervals, andeach of which has a rectangular shape extending in the second direction;and a third via hole pattern which is arranged at positions at which thethird wiring pattern and the fourth wiring pattern overlap, and whichelectrically connects the third wiring pattern and the fourth wiringpattern.

Each of the multiple copper wiring members included in the second wiringpattern may overlap or may be overlaid with the corresponding one of themultiple copper wiring members included in the fourth wiring pattern.

The via holes included in the third via hole pattern may be arranged soas to overlap or be overlaid with the respective via holes included inthe second via hole pattern, with the centers thereof matching oneanother.

The semiconductor apparatus may further include: aluminum wiring formedin an aluminum wiring layer provided as an upper layer adjacent to thefirst copper wiring layer, and occupying approximately the same regionas the aforementioned predetermined region; and a via hole pattern whichconnects the aluminum wiring and the first wiring pattern.

It is to be noted that any arbitrary combination or rearrangement of theabove-described structural components and so forth is effective as andencompassed by the present embodiments.

Moreover, this summary of the invention does not necessarily describeall necessary features so that the invention may also be asub-combination of these described features.

BRIEF DESCRIPTION OF THE DRAWINGS

Embodiments will now be described, by way of example only, withreference to the accompanying drawings which are meant to be exemplary,not limiting, and wherein like elements are numbered alike in severalFigures, in which:

FIG. 1 is a plan view which shows a configuration of a semiconductorapparatus according to an embodiment;

FIG. 2A through FIG. 2E are plan views which show a configuration oflow-impedance wiring;

FIG. 3 is a diagram which shows a connection arrangement in whichadjacent copper wiring layers are connected to each other; and

FIG. 4 is a diagram which shows a layout arrangement of layered wiringpatterns that form the low-impedance wiring according to the embodiment.

DETAILED DESCRIPTION OF THE INVENTION

The invention will now be described based on preferred embodiments whichdo not intend to limit the scope of the present invention but exemplifythe invention. All of the features and the combinations thereofdescribed in the embodiment are not necessarily essential to theinvention.

FIG. 1 is a plan view which shows a configuration of a semiconductorapparatus 100 according to an embodiment. The semiconductor apparatus100 has a configuration in which multiple copper wiring layers andmultiple insulating layers are alternately layered. FIG. 1 shows a partof the uppermost layer viewed from the top. The semiconductor apparatus100 includes pads P1 through P6, wiring 10, and a circuit portion 30.The pads P1 through P6 are provided in order to allow gold wires to bebonded. The circuit portion 30 includes circuit elements such astransistors, resistors, capacitors, etc., formed thereon. These circuitelements are connected to each other according to functions to beprovided.

In the semiconductor apparatus 100 shown in FIG. 1, the multiple pads P1through P4 generate the same electric potential. The pads P1 through P4are electrically connected to each other via the wiring 10 formedoccupying a predetermined region RGN0. For example, the pads P1 throughP4 are: (1) pads via which power supply voltage is supplied; (2) padsvia which ground voltage is supplied; (3) pads through which greatcurrent flows; or (4) pads to which voltage having a large amplitude isapplied. Pads P5 and P6 are provided independent of the pads P1 throughP4.

In the case of the aforementioned items (1) or (2), the pads P1 throughP4 serve as input terminals. The power supply voltage (or groundvoltage) applied to the pads P1 through P4 is supplied to the wiring 10provided in the form of a land or a plate (which will also be referredto as “land wiring” or “plate wiring”). The power supply voltage (orground voltage) thus applied is distributed to desired portions withinthe circuit portion 30 via ordinary wiring branching from the wiring 10.

Examples of the aforementioned items (3) or (4) includes: a case inwhich an output stage of a power amplifier which amplifies an audiosignal is connected to these pads; a case in which an output stage of acomputation amplifier for a large signal is connected to these pads; acase in which a power transistor used as a switching transistor isconnected to these pads; and a push-pull output stage of a motor driveris connected to these pads. In such a case, the wiring 10 will also bereferred to as “power wiring”. It should be noted that the usage of thepresent invention is not restricted to such an arrangement.

The wiring 10, which functions as land (plate) wiring or power wiring,needs to be formed with low impedance. Accordingly, the wiring 10 ispreferably formed with as large an area as possible. From this point ofview, the wiring functioning as land wiring or power wiring will bereferred to as “low-impedance wiring 10”.

FIGS. 2A through 2E are plan views which shows a configuration of thelow-impedance wiring 10. FIGS. 2A through 2E show the fifth wiringlayer, the fourth wiring layer, the third wiring layer, the secondwiring layer, and the first wiring layer, in this order. The fifthwiring layer L5 is a wiring layer which is formed as the uppermost layerof the semiconductor apparatus 100, and includes aluminum wiring formedtherein, for example. On the other hand, each of the first wiring layerL1 through the fourth wiring layer L4 includes copper wiring formedtherein.

The fourth wiring layer L4 is the first copper wiring layer. As shown inFIG. 2B, in the first copper wiring layer (fourth wiring layer L4),multiple copper wiring members Lc1 are formed in parallel withpredetermined intervals d1. Each of the multiple copper wiring membersLc1 has a rectangular shape extending in a first direction. The multiplecopper wiring members Lc1 have the same shape. These multiple copperwiring members Lc1 will be referred to as “first wiring pattern”.

The third wiring layer L3 is the second copper wiring layer adjacent tothe fourth wiring layer L4, i.e., the first copper wiring layer. Asshown in FIG. 2C, in the second copper wiring layer (third wiring layerL3), multiple copper wiring members Lc2 are formed in parallel withpredetermined intervals d2. Each of the multiple copper wiring membersLc2 has a rectangular shape extending in a second direction orthogonalto the first direction. The multiple copper wiring members Lc2 have thesame shape. These multiple copper wiring members Lc2 will be referred toas “second wiring pattern”.

The region RGN1 occupied by the first wiring pattern Lc1, the regionRGN2 occupied by the second wiring pattern Lc2, and the predeterminedregion RGN0, at least overlap. In the example shown in FIG. 1, theregions RGN0, RGN1, and RGN2 match each other.

The second wiring layer L2 is the third copper wiring layer adjacent tothe third wiring layer L3, i.e., the second copper wiring layer. Asshown in FIG. 2D, in the third copper wiring layer (second wiring layerL2), multiple copper wiring members Lc3 are formed in parallel with thepredetermined intervals d1. Each of the multiple copper wiring membersLc3 has a rectangular shape extending in the first direction. Themultiple copper wiring members Lc3 have the same shape. These multiplecopper wiring members Lc3 will be referred to as “third wiring pattern”.

The first wiring layer L1 is the fourth copper wiring layer adjacent tothe second wiring layer L2, i.e., the third copper wiring layer. Asshown in FIG. 2E, in the fourth copper wiring layer (first wiring layerL1), multiple copper wiring members Lc4 are formed in parallel with thepredetermined intervals d2. Each of the multiple copper wiring membersLc4 has a rectangular shape extending in the second direction. Themultiple copper wiring members Lc4 have the same shape. These multiplecopper wiring members Lc4 will be referred to as “fourth wiringpattern”.

The fifth wiring layer L5 is an aluminum wiring layer formed adjacent tothe fourth wiring layer L4. Aluminum wiring La, which occupiesapproximately the same region as the predetermined region RGN0 shown inFIG. 1, is formed in the fifth wiring layer L5. The aluminum wiring Laand the first wiring pattern Lc1 are electrically connected to eachother through multiple via holes. As many via holes as possible arepreferably formed.

FIG. 3 is a diagram which shows a connection arrangement in whichadjacent copper wiring layers are connected to each other. The firstwiring pattern Lc1 and the second wiring pattern Lc2 are electricallyconnected to each other via a first via hole pattern including at leastone first via hole V1. The first via hole V1 is provided at a position(intersection) at which the first wiring pattern Lc1 and the secondwiring pattern Lc2 overlap (i.e., intersect). FIG. 3 shows only a singlefirst via hole V1. However, multiple first via holes are preferablyformed at the intersections at which the first wiring pattern Lc1 andthe second wiring pattern lc2 intersect.

Each of the multiple copper wiring members Lc1 included in the firstwiring pattern overlaps the corresponding one of the multiple copperwiring members Lc3 included in the third wiring pattern. Similarly, eachof the multiple copper wiring members Lc2 included in the second wiringpattern overlaps the corresponding one of the multiple copper wiringmembers Lc4 included in the fourth wiring pattern.

The second wiring pattern Lc2 and the third wiring pattern Lc3 areelectrically connected to each other via a second via hole patternincluding at least one second via hole V2. The second via hole V2 isprovided at a position (intersection) at which the second wiring patternLc2 and the third wiring pattern Lc3 overlap (i.e., intersect). FIG. 3shows only a single second via hole V2. However, multiple second viaholes are preferably formed at the intersections at which the secondwiring pattern Lc2 and the third wiring pattern Lc3 intersect.

The third wiring pattern Lc3 and the fourth wiring pattern Lc4 areelectrically connected to each other via a third via hole patternincluding at least one third via hole V3. The third via hole V3 isprovided at a position (intersection) at which the third wiring patternLc3 and the fourth wiring pattern Lc4 overlap (i.e., intersect). FIG. 3shows only a single third via hole V3. However, multiple third via holesare preferably formed at the intersections at which the third wiringpattern Lc3 and the fourth wiring pattern Lc4 intersect.

The via holes included in the second via hole pattern are arranged so asto overlap or be overlaid with the respective via holes included in thefirst via hole pattern, with the centers thereof matching one another.In the same way, the via holes included in the third via hole patternare arranged so as to overlap or be overlaid with the respective viaholes included in the second via hole pattern, with the centers thereofmatching one another. That is to say, the wiring patterns formed in themultiple copper wiring layers are connected to each other through viaholes, each of which is formed so as to pass through these multiplecopper wiring layers.

As described above, by providing via holes at all the intersections atwhich a wiring pattern intersects with an adjacent wiring pattern formedsuch that it extends in a direction orthogonal to the direction in whichthe former wiring pattern extends, such an arrangement suitably reducesthe impedance of the low-impedance wiring 10 without a risk due to thelayout.

FIG. 4 is a diagram which shows a layout arrangement of the wiringpatterns that form the low-impedance wiring 10 according to theembodiment. As described above, the first wiring pattern Lc1 and thethird wiring pattern Lc3 overlap or are overlaid with each other. On theother hand, the second wiring pattern Lc2 and the fourth wiring patternLc4 overlap or are overlaid with each other. Each of the wiring patternsLc1 and Lc3 and each of the wiring patterns Lc2 and Lc4 are formedorthogonal to one another, in the form of a grid (waffle).

The above-described is the configuration of the semiconductor apparatus100. The low-impedance wiring 10 is formed of wiring patterns formed inmultiple wiring layers. Furthermore, the wiring members formed in thesame wiring layer are formed with predetermined intervals. Accordingly,by suitably selecting the wiring width and the wiring interval for eachwiring pattern, such an arrangement suppresses dishing, therebyimproving the reliability.

Furthermore, by forming the wiring with as large the wiring width aspossible and with as small the wiring interval as possible according tothe process rule, such an arrangement reduces the impedance of thewiring.

The above-described embodiments have been described for exemplarypurposes only, and are by no means intended to be interpretedrestrictively. Rather, it can be readily conceived by those skilled inthis art that various modifications may be made by making variouscombinations of the aforementioned components or processes, which arealso encompassed in the technical scope of the present invention.

Description has been made in the embodiment regarding an arrangement inwhich the first wiring layer L1 employs aluminum wiring and the secondwiring layer through the fifth wiring layer employ copper wiring.However, the present invention is not restricted to such an arrangement.The low-impedance wiring 10 may be configured of at least two wiringlayers. That is to say, such an arrangement should include at least twowiring layers, e.g., the first wiring pattern Lc1 and the second wiringpattern Lc2 shown in FIGS. 2B and 2C. By increasing the number of wiringlayers in addition to the first wiring pattern Lc1 and the second wiringpattern Lc2, the impedance can be further reduced.

Description has been made in the embodiment regarding an arrangement inwhich each wiring member included in the first wiring pattern Lc1overlaps or is overlaid with the corresponding wiring member included inthe third wiring pattern Lc3. Also, the first wiring pattern Lc1 and thethird wiring pattern Lc3 may be arranged with an offset of half thewiring pitch such that they do not overlap. Also, the second wiringpattern Lc2 and the fourth wiring pattern Lc4 may be arranged in thesame fashion.

While the preferred embodiments of the present invention have beendescribed using specific terms, such description is for illustrativepurposes only, and it is to be understood that changes and variationsmay be made without departing from the spirit or scope of the appendedclaims.

In the claims:
 1. A semiconductor apparatus having a configuration inwhich a plurality of metal wiring layers and a plurality of insulatinglayers are alternately layered, wherein the semiconductor apparatuscomprises: a first wiring pattern formed in a first metal wiring layer,including a plurality of metal wiring members which are formed inparallel with predetermined intervals, and each of which has arectangular shape extending in a first direction; and a second wiringpattern formed in a second metal wiring layer adjacent to the firstmetal wiring layer, including a plurality of metal wiring members whichare formed in parallel with predetermined intervals, and each of whichhas a rectangular shape extending in a second direction orthogonal tothe first direction, and wherein the region occupied by the first metalwiring pattern and the region occupied by the second metal wiringpattern at least overlap, and wherein the first wiring pattern and thesecond wiring pattern are electrically connected to each other so as tohave the same electric potential.
 2. A semiconductor apparatus accordingto claim 1, further including a first via hole pattern which is arrangedat positions at which the metal wiring members included in the firstwiring pattern and the metal wiring members included in the secondwiring pattern overlap, and which electrically connects the first wiringpattern and the second wiring pattern.
 3. A semiconductor apparatusaccording to claim 2, further including: a third wiring pattern formedin a third metal wiring layer adjacent to the second metal wiring layer,including a plurality of metal wiring members arranged in parallel withpredetermined intervals, and each of which has a rectangular shapeextending in the first direction; and a second via hole pattern which isarranged at positions at which the second wiring pattern and the thirdwiring pattern overlap, and which electrically connects the secondwiring pattern and the third wiring pattern.
 4. A semiconductorapparatus according to claim 3, wherein each of the plurality of metalwiring members included in the first wiring pattern overlaps or isoverlaid with the corresponding one of the plurality of metal wiringmembers included in the third wiring pattern.
 5. A semiconductorapparatus according to claim 4, wherein the via holes included in thesecond via hole pattern are arranged so as to overlap or be overlaidwith the respective via holes included in the first via hole pattern,with the centers thereof matching one another.
 6. A semiconductorapparatus according to claim 3, further including: a fourth wiringpattern formed in a fourth metal wiring layer adjacent to the thirdmetal wiring layer, including a plurality of metal wiring membersarranged in parallel with predetermined intervals, and each of which hasa rectangular shape extending in the second direction; and a third viahole pattern which is arranged at positions at which the third wiringpattern and the fourth wiring pattern overlap, and which electricallyconnects the third wiring pattern and the fourth wiring pattern.
 7. Asemiconductor apparatus according to claim 6, wherein each of theplurality of metal wiring members included in the second wiring patternoverlaps or is overlaid with the corresponding one of the plurality ofmetal wiring members included in the fourth wiring pattern.
 8. Asemiconductor apparatus according to claim 7, wherein the via holesincluded in the third via hole pattern are arranged so as to overlap orbe overlaid with the respective via holes included in the second viahole pattern, with the centers thereof matching one another.
 9. Asemiconductor apparatus according to claim 1, further including:aluminum wiring formed in an aluminum wiring layer provided as an upperlayer adjacent to the first metal wiring layer, and occupying apredetermined region; and a via hole pattern which connects the aluminumwiring and the first wiring pattern.